Method of manufacturing microstructure, method of...

Incremental printing of symbolic information – Ink jet – Ejector mechanism

Reexamination Certificate

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C347S047000, C430S320000, C430S326000

Reexamination Certificate

active

06951380

ABSTRACT:
A liquid discharge head which is inexpensive, accurate, and highly reliable, and a method of manufacturing such a liquid discharge head are provided. On a substrate, a thermal crosslinking positive photosensitive material layer (a first positive photosensitive material layer) and a second positive photosensitive material layer are formed. First a pattern is formed on the second positive photosensitive material layer, then another pattern is formed on the first positive photosensitive material layer. Next, a negative resin for forming a liquid channel wall is laminated on the patterned first and second positive photosensitive material layers. A discharge port is formed in the negative resin layer and then the positive photosensitive material layers are removed. At this time, the first positive photosensitive material layer is an ionizing radiation decompositive positive resist composed of a methacrylic copolymer composite mainly containing methacrylic acid where a metacrylic acid unit is 2 to 30 wt % and molecular weight is 5,000 to 50,000, and the second positive photosensitive material layer is an ionizing radiation decompositive positive resist mainly containing polymethyl isopropenyl ketone.

REFERENCES:
patent: 4565859 (1986-01-01), Murai et al.
patent: 4657631 (1987-04-01), Noguchi
patent: 4882595 (1989-11-01), Trueba et al.
patent: 5331344 (1994-07-01), Miyagawa et al.
patent: 5478606 (1995-12-01), Ohkuma et al.
patent: 5730889 (1998-03-01), Miyagawa et al.
patent: 5945260 (1999-08-01), Miyagawa et al.
patent: 6158843 (2000-12-01), Murthy et al.
patent: 6179413 (2001-01-01), Coulman et al.
patent: 2003/0011655 (2003-01-01), Miyagawa et al.
patent: 734866 (1996-10-01), None
patent: 0734866 (1999-08-01), None
patent: 60-161973 (1985-08-01), None
patent: 63-221121 (1988-09-01), None
patent: 64-9216 (1989-01-01), None
patent: 2-140219 (1990-05-01), None
patent: 4-216952 (1992-08-01), None
patent: 6-45242 (1994-06-01), None
patent: 10-291317 (1998-11-01), None
patent: 2000/326515 (2000-11-01), None
patent: 3143307 (2000-12-01), None
Journal of Polymer Science “Fourth International Symposium on Cationic Polymerization”, pp 383-395, (1976).

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