Method of manufacturing microstructure by the anisotropic etchin

Details Method of manufacturing microstructure by the anisotropic etchin Method of manufacturing microstructure by the anisotropic etchin

1994-11-22

1996-12-31

Powell, William

Etching a substrate: processes

Forming or treating optical article

1566331, 1566471, 1566571, 216 2, 216 33, 216 41, H01L 2100, B44C 122

Patent

active

055890830

ABSTRACT:
The present invention relates to a method of manufacturing microstructure by the anisotropic etching and bonding of substrates so as to manufacture mechanically functioning micro-structures in various forms by uniting the same or different substrate bonding technique and selective anisotropic etching technique. This invention manufactures a pyramidal optical divider or an optical divider with a pyramidal structure located on a quadrilateral pillar by bonding one substrate on a substrate different in the direction of crystallization and anisotropically etching them thereafter. This invention manufactures variously shaped nozzles by bonding those substrates crystallized in a different direction and anisotropically etching them so that substrates bonded by one photograph transferring process may form different etching holes. This invention manufactures a diaphragm having a uniform thickness and a wide area by bonding two substrates different in the direction of crystallization or in the concentration of an impurity, removing a substrate of prescribed concentration and anisotropically etching only one substrate of the remaining substrates.

REFERENCES:
patent: 3332137 (1967-07-01), Kenney
patent: 3783218 (1974-01-01), Adams et al.
patent: 3844858 (1974-10-01), Bean
patent: 4056413 (1977-11-01), Yoshimura
patent: 5017263 (1991-05-01), Clark

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