Method of manufacturing microneedle structures using soft...

Plastic and nonmetallic article shaping or treating: processes – Direct application of electrical or wave energy to work – Polymerizing – cross-linking – or curing

Reexamination Certificate

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C264S225000, C264S319000

Reexamination Certificate

active

06663820

ABSTRACT:

TECHNICAL FIELD
The present invention relates generally to microneedle arrays and is particularly directed to a method for manufacturing microneedle structures using soft lithography and photolithography. The invention is specifically disclosed as a method of manufacturing microneedles by creating micromold structures made of a photoresist material or PDMS, and in some cases using a sacrificial layer for ease of separation from a substrate layer.
BACKGROUND OF THE INVENTION
Topical delivery of drugs is a very useful method for achieving systemic or localized pharmacological effects, although there is a main challenge involved in providing sufficient drug penetration across the skin. Skin consists of multiple layers, in which the stratum corneum layer is the outermost layer, then a viable epidermal layer, and finally a dermal tissue layer. The thin layer of stratum corneum represents a major barrier for chemical penetration through the skin. The stratum corneum is responsible for 50%-90% of the skin barrier property, depending upon the drug material's water solubility and molecular weight.
An alternative to the use of hypodermic needles for drug delivery by injection is disclosed in U.S. Pat. No. 3,964,482 (by Gerstel), in which an array of either solid or hollow microneedles is used to penetrate through the stratum corneum and into the epidermal layer. Fluid is dispensed either through the hollow microneedles or through permeable solid projections, or perhaps around non-permeable solid projections that are surrounded by a permeable material or an aperture. A membrane material is used to control the rate of drug release, and the drug transfer mechanism is absorption.
Other types of microneedle structures are disclosed in WO 98/00193 (by Altea Technologies, Inc.), and in WO 97/48440, WO 97/48441, and WO 97/48442 (by Alza Corp.). In addition, WO 96/37256 discloses another type of microblade structure.
The use of microneedles has one great advantage in that intracutaneous drug delivery or drug sampling can be accomplished without pain and without bleeding. As used herein, the term “microneedles” refers to a plurality of elongated structures that are sufficiently long to penetrate through the stratum corneum skin layer and into the epidermal layer. In general, the microneedles are not to be so long as to penetrate into the dermal layer, although there are circumstances where that would be desirable. Since microneedles are relatively difficult to manufacture, it would be an advantage to provide methodologies for constructing microneedles that are made from various types of micromolds that can be manufactured relatively quickly. The use of metallic molds or semiconductor molds is possible, but such structures usually take a relatively long period of time for construction. On the other hand, if the molds are made of a polymer or other type of plastic (or other moldable) material, then such mold structures can be made relatively quickly and with much less expense.
SUMMARY OF THE INVENTION
Accordingly, it is an advantage of the present invention to provide a method for fabricating microneedles using photolithography and soft lithography techniques, which allow for quick manufacturing of both micromolds and usable microneedle structures.
It is another advantage of the present invention to provide a method for fabricating microneedles in which a photoresist material is applied in a single layer, or in multiple layers, and patterned via photolithography, thereby either creating a microneedle structure that can be directly used, or creating micromold structure that can be used with moldable material such as polymers to manufacture the microneedle structures.
It is a further advantage of the present invention to provide a method for fabricating microneedles in which soft lithography is used to create microneedle structures that can be directly used, or to create micromold structures that can be used with moldable material such as polymers to manufacture the microneedle structures, in which a moldable material has its shape formed, at least in part, by another relatively “soft” material—e.g., something other than a metal.
It is still another advantage of the present invention to provide a method for fabricating microneedles in which soft lithography is used to create microneedle structures that can be used to create flexible micromold structures that can be used with moldable material such as polymers to manufacture the microneedle structures, in which the resulting microneedle array is either concave or convex in overall shape.
It is yet a further advantage of the present invention to provide a method for fabricating microneedles in which photolithography and/or soft lithography is used to create micromold structures, and in which a sacrificial layer of material is dissolved or decomposed to separate the micromold structures from a substrate.
It is still a further advantage of the present invention to provide a method for fabricating microneedles in which photolithography and/or soft lithography is used to create microneedle structures, and further coating a surface of the microneedle structures using a vapor deposition process, and/or another coating process such as: electroplating, electrodeposition, electroless plating, sputtering, or plasma deposition.
It is yet another advantage of the present invention to provide a method for fabricating microneedles in which photolithography and/or soft lithography is used to create master structures, and further using a microembossing or molding process to manufacture microneedle structures.
It is still another advantage of the present invention to provide a method for fabricating microneedles in which photolithography and/or soft lithography is used to create microneedle structures, and further creating electrodes on the microneedle structures, either in “bands” of electrically conductive material that each encompass multiple microneedles, or in individual small electrically conductive structures that run inside a single hollow microneedle.
It is a further advantage of the present invention to provide a method for fabricating microneedles in which photolithography and/or soft lithography is used to create microneedle structures, in which the tips of the microneedles are either hardened or made more flexible, or in which the base (or substrate) of the microneedle array is made more flexible, or in which the microneedles break away from the base (substrate) of the array after application to skin, thereby leaving behind hollow microtubes that protrude through the stratum corneum.
Additional advantages and other novel features of the invention will be set forth in part in the description that follows and in part will become apparent to those skilled in the art upon examination of the following or may be learned with the practice of the invention.
To achieve the foregoing and other advantages, and in accordance with one aspect of the present invention, a method for fabricating microneedles is provided including steps of: (a) providing a substrate that includes multiple microstructures; (b) coating the substrate with a layer of a first moldable material that takes the negative form of the microstructures, and hardening the first moldable material; (c) separating the hardened first moldable material from the substrate, and creating a micromold from the hardened first moldable material containing the microstructures; and (d) applying a second moldable material onto the micromold, allowing the second moldable material to harden using a soft lithography procedure, then separating the hardened second moldable material from the micromold, thereby creating a microneedle structure from the hardened second moldable material having the three-dimensional negative form of the microstructures of the patterned micromold.
In accordance with another aspect of the present invention, a method for fabricating microneedles is provided including steps of: (a) providing a substrate material; (b) coating the substrate material with at least one layer of a photoresist mate

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