Etching a substrate: processes – Nongaseous phase etching of substrate – With measuring – testing – or inspecting
Patent
1996-09-12
1999-02-02
Knode, Marian C.
Etching a substrate: processes
Nongaseous phase etching of substrate
With measuring, testing, or inspecting
B44C 122
Patent
active
058660216
ABSTRACT:
A micro-tip is manufactured by forming a recess portion on a first substrate consisting of monocrystalline silicon for forming a tip. A peeling layer is formed on the recess portion, and contact layer is formed on at least a portion other than the peeling layer on the substrate. A tip material layer is formed on the peeling layer and the contact layer. The tip material layer on the peeling layer is transferred onto a second substrate.
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Ikeda Tsutomu
Shimada Yasuhiro
Yagi Takayuki
Brynback Brenda G.
Canon Kabushiki Kaisha
Knode Marian C.
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