Method of manufacturing masked semiconductor laser

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

148DIG72, 148DIG94, 148DIG169, 156644, 372 49, 372103, 427 531, 437133, 437173, 437935, 437936, 437962, 437984, H01L 2120, H01L 21203

Patent

active

048552569

ABSTRACT:
A masking layer is formed on the light-emitting mirror surface of a semiconductor laser body. The masking layer is capable of blocking light emitted from the semiconductor laser body and of being thermally melted and evaporated by exposure to the emitted light. When the masking layer is formed on the light-emitting mirror surface of the semiconductor laser body, a small light-emitting hole is defined in the masking layer by the heat of the emitted light which is effective to prevent the material of the masking layer from being evaporated on a portion of the light-emitting surface.

REFERENCES:
patent: 3849738 (1974-11-01), Hakki
patent: 3866238 (1975-02-01), Monroe
patent: 4001719 (1977-01-01), Krupka
patent: 4100508 (1978-07-01), Wittke
patent: 4178564 (1979-12-01), Ladany et al.
patent: 4317086 (1982-02-01), Scifres et al.
patent: 4337443 (1982-06-01), Umeda et al.
patent: 4653059 (1987-03-01), Akiba
patent: 4656638 (1987-04-01), Tihanyi et al.
Ettenberg, "A New Dielectric Facet Reflector for Semiconductor Lasers", Appl. Phys. Lett., vol. 32, No. 11, Jun. 1, 1978, pp. 724-725.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of manufacturing masked semiconductor laser does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing masked semiconductor laser, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing masked semiconductor laser will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-905421

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.