Method of manufacturing mask type read only memory

Details Method of manufacturing mask type read only memory Method of manufacturing mask type read only memory

1982-08-17

1984-08-28

Roy, Upendra

Metal working

Method of mechanical manufacture

Assembling or joining

29571, 29578, 148 15, 148187, 357 23, 357 91, H01L 21265, H01L 2122

Patent

active

044675208

ABSTRACT:
A method of manufacturing a mask type read only memory having an interconnection wiring and a plurality of MOS transistors, wherein selected source and drain regions are shortened in accordance with a user program after the interconnection wiring layer is formed on the semiconductor substrate. After that, a protective film is formed over the entire surface of the read only memory.

REFERENCES:
patent: 4108686 (1978-08-01), Jacobus, Jr.
patent: 4336647 (1982-06-01), McElroy
patent: 4356042 (1982-10-01), Gedaly et al.
patent: 4364165 (1982-12-01), Dickman et al.
patent: 4364167 (1982-12-01), Donley
patent: 4365405 (1982-12-01), Dickman et al.
patent: 4380866 (1983-04-01), Countryman, Jr. et al.
patent: 4384399 (1983-05-01), Kuo
patent: 4406049 (1983-09-01), Tam et al.

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