Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2008-05-27
2008-05-27
Rosasco, S. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
10982813
ABSTRACT:
A mask corrects for an optical proximity effect (OPE). A dummy pattern having a phase-edge effect is formed on a mask substrate. The phase-edge effect reduces the intensity of light at the boundary of two transmitting regions from through transmitted light has a phase difference. A pattern can then be formed in a photolithographic process using the phase-edge effect. A difference between “isolated” and “dense” patterns formed on a wafer can be reduced by forming a dummy pattern in an isolated pattern region of the mask and making the diffraction pattern of the isolated pattern the same as that of the dense pattern, thereby improving the total focus margin. Because the intensity of light is reduced at the boundary between a first region in which the phase of the transmitted light is 0° and a second region in which the phase of the transmitted light is 180°, for example, a photoresist layer is not photosensitized.
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Cho Han-ku
Kim Byeong-Soo
Rosasco S.
Volentine & Whitt PLLC
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