Semiconductor device manufacturing: process – Repair or restoration
Reexamination Certificate
2005-01-11
2005-01-11
Chaudhari, Chandra (Department: 2813)
Semiconductor device manufacturing: process
Repair or restoration
C438S016000, C438S949000
Reexamination Certificate
active
06841399
ABSTRACT:
The manufacturing time of a mask is shortened. In a defect inspection of a mask having a light-shielding portion composed of a resist film, the presence or absence of defects, such as burr and film loss of a resist pattern on the mask, and foreign matters, etc. is inspected by reading optical information on either or both of reflection light and transmission light with respect to inspection light irradiated to the mask by the use of a foreign-matter inspection system. More specifically, in the inspection of the mask, it is possible to perform the defect inspection without performing a comparison inspection that requires a great amount of measuring time and advanced techniques. Therefore, the inspecting process of the mask can be simplified, and also the inspecting time of the mask can be shortened.
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“Story About The Photomask Technique”, pp. 63-76, no date.
Hasegawa Norio
Hayano Katsuya
Hoga Morihisa
Koizumi Yasuhiro
Kubo Shinji
Antonelli Terry Stout & Kraus LLP
Chaudhari Chandra
Dai Nippon Printing Co. Ltd.
Renesas Technology Corp.
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