Etching a substrate: processes – Forming or treating article containing magnetically...
Reexamination Certificate
2010-02-12
2011-10-04
Vinh, Lan (Department: 1713)
Etching a substrate: processes
Forming or treating article containing magnetically...
C216S040000, C216S075000, C438S754000
Reexamination Certificate
active
08029682
ABSTRACT:
According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist, etching the second hard mask by using the patterned resist as a mask to transfer the patterns of protrusions and recesses to the second hard mask, etching the first hard mask by using the second hard mask as a mask to transfer the patterns of protrusions and recesses to the first hard mask, subjecting the magnetic recording layer exposed in the recesses to modifying treatment to change an etching rate, and deactivating the magnetic recording layer exposed in the recesses.
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Explanation of Non-English Language References.
Isowaki Yousuke
Kamata Yoshiyuki
Kimura Kaori
Sakurai Masatoshi
Kabushiki Kaisha Toshiba
Knobbe Martens Olson & Bear LLP
Vinh Lan
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