Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2005-11-01
2005-11-01
Pert, Evan (Department: 2826)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C349S187000
Reexamination Certificate
active
06960484
ABSTRACT:
A method of manufacturing a liquid crystal display device includes steps of forming a gate line, a gate pad and a gate electrode on a first substrate through a first mask process, forming a data line, a data pad, a source electrode, a drain electrode and an active layer on the first substrate including the gate line, the gate pad and the gate electrode through a second mask process, forming a pixel electrode and a data pad terminal on the first substrate including the data line, the data pad, the source electrode and the drain electrode through a third mask process, forming a passivation layer on an entire surface of the first substrate including the pixel electrode and the data pad terminal, attaching the first substrate including the passivation layer with a second substrate, wherein a gate pad portion including the gate pad and a data pad portion including the data pad are exposed by the second substrate, providing a liquid crystal material into a gap between the first and second substrates, and removing the passivation layer in the gate and data pad portions exposed by the second substrate.
Chang Youn-Gyoung
Cho Heung-Lyul
Nam Seung-Hee
Yoo Soon-Sung
LG.Philips LCD Co. , Ltd.
McKenna Long & Aldridge LLP
Pert Evan
LandOfFree
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