Method of manufacturing liquid crystal display

Details Method of manufacturing liquid crystal display Method of manufacturing liquid crystal display

2007-01-02

2007-01-02

Booth, Richard A. (Department: 2812)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C257SE21415

Reexamination Certificate

active

10842553

ABSTRACT:
A conductive layer, a metal layer and a doped layer are sequentially formed on a glass substrate. A CMOS circuit region, a transistor region, a reflective region, a transmission region and a capacitor region are defined. Next, a polysilicon layer and an insulating layer are formed to serve as a source/drain region, a channel region and a gate insulating layer. Then, a resin layer with a rough surface is formed. Next, a metal layer is formed to serve as a gate structure and a reflective electrode. Then, an ion implanting process is performed to form the source/drain structure of a PMOS. Then, a passivation layer is formed to define a transmission region. Finally, the metal layer and the doped layer are removed to expose the conductive layer.

REFERENCES:
patent: 11-218788 (1999-08-01), None
patent: 2001-060693 (2001-03-01), None
patent: 1234030 (2005-06-01), None

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