Method of manufacturing ion selective electrode pair

Details Method of manufacturing ion selective electrode pair Method of manufacturing ion selective electrode pair

1985-05-16

1987-07-28

Tung, T.

Chemistry: electrical and wave energy

Apparatus

Electrolytic

204418, 204419, 83875, G01N 2746

Patent

active

046830480

ABSTRACT:
A conductive layer is formed on an insulating base, and at least one groove is formed in the conductive layer by cutting a part of the material of the conductive layer so that the conductive layer is divided into at least a pair of portions electrically isolated from each other by the cut groove. Thereafter, an ion selective layer is formed on the conductive layer to cover substantially the entire surface of the conductive layer including the cut groove.

REFERENCES:
patent: 4053381 (1977-10-01), Hamblen et al.
patent: 4083390 (1978-04-01), Ingham
patent: 4214968 (1980-07-01), Battaglia et al.
patent: 4243082 (1981-01-01), Paris et al.
patent: 4528085 (1985-07-01), Kitajima et al.

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