Method of manufacturing integrated circuits by means of a multil

Details Method of manufacturing integrated circuits by means of a multil Method of manufacturing integrated circuits by means of a multil

1980-04-14

1983-01-18

Ozaki, G.

Metal working

Plural diverse manufacturing apparatus including means for...

Common reciprocating support for spaced tools

29571, 29576B, 29577C, 29578, 148187, 357 34, H01L 2126, H01L 2122

Patent

active

043685730

ABSTRACT:
A method of manufacturing integrated circuits by means of a multilayer mask.
Etching of the layers of the mask comprises a lateral etching of the bottom layer so that at the edge of the auxiliary layer edges appear which are removed partly prior to forming an insulating layer and partly after the formation thereof, after which a remainder of a mask portion is also removed as a result of which removal apertures for the formation of zones are determined.

REFERENCES:
patent: 3940288 (1976-02-01), Takagi et al.
patent: 4046607 (1977-09-01), Inoue et al.
patent: 4111726 (1978-09-01), Chen
patent: 4115797 (1978-09-01), Hingarh et al.
patent: 4127864 (1978-11-01), Jochems
patent: 4261763 (1981-04-01), Kumar et al.

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