Method of manufacturing fluorine-doped optical fibers

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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427163, B05D 306, C23C 1100

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active

044684134

ABSTRACT:
Doped silica glass can be manufactured by reacting gaseous vapors of silica-forming compounds and dopant-forming compounds. Increased fluorine dopant can be provided with less fluorine dopant-forming compound, when the fluorine dopant-forming compound is hexafluoroethane (C.sub.2 F.sub.6).

REFERENCES:
patent: Re30635 (1981-06-01), Kuppers et al.
patent: 4045198 (1977-08-01), Rau et al.
patent: 4221825 (1980-09-01), Guerder et al.
Abe, K., "Fluorine Doped Silica for Optical Waveguides," 2nd ECOC, IEE, Paris, 1976.
Ainslie, G. J., et al., "Preparation of Long Lengths of Ultra-Low-Loss Single-Mode Fibre," Electronics Letters, vol. 15, No. 14, pp. 411-413, (Jul. 1979).
Fleming, J. W., et al., "Low-Loss Single-Mode Fibers Prepared by Plasma-Enhanced MCVD," Electronics Letters, vol. 17, No. 23, pp. 867-868, (Nov. 1981).
Geittner, T., et al., "Low-Loss Optical Fibers Prepared by Plasma-Activated Chemical Vapor Deposition (CVD)," Applied Physics Letters, vol. 28, No. 11, pp. 645-646, (1976).
Kuppers, D., et al., "Application of the Plasma-Activated Chemical Vapour Deposition (PCVD) Process to the Preparation of Fluorine Doped Fibres," Third ECOC, Munich, 1977.
Kuppers, D., et al., "Deposition of Fluorine-Doped Silica Layers from a SiCl.sub.4 /SiF.sub.4 /O.sub.2 Gas Mixture by the Plasma-CVD Method," Journal of the Electrochemical Society: Solid-State Science and Technology, vol. 125, No. 8, pp. 1298-1302, (Aug. 1978).
Muhlich, A., et al., "A New Doped Synthetic Fused Silica as Bulk Material for Low-Loss Optical Fibres," First ECOC, IEE, London, 1975.
Muhlich, A., et al., "Preparation of Fluorine-Doped Silica Preforms by Plasma Chemical Technique," Third ECOC, Munich, 1977.
Rau, K., et al., "Progress in Silica Fibers with Fluorine Dopant," Topical Meeting on Fiber Transmission, IEEE, Williamsburg, 1977.

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