Etching a substrate: processes – Forming or treating electrical conductor article
Reexamination Certificate
2006-03-28
2006-03-28
Olsen, Allan (Department: 1763)
Etching a substrate: processes
Forming or treating electrical conductor article
C216S057000, C216S067000, C216S083000, C216S088000, C216S100000, C216S109000, C438S637000, C438S700000, C438S704000, C438S710000, C438S745000, C438S906000, C438S963000, C134S001300, C134S902000
Reexamination Certificate
active
07018552
ABSTRACT:
A method of manufacturing an electronic device comprises forming a wiring material layer made of aluminum or an aluminum alloy on the surface of an insulating film on a substrate, patterning the wiring material layer by a reactive ion etching treatment with a resist pattern used as a mask so as to form a wiring, and treating the surface of the insulating film including the wiring with an aqueous solution for removing the etching residue, the aqueous solution containing a peroxosulfate, a fluorine-containing compound and an acid for adjusting the pH value and having a pH value of −1 to 3.
REFERENCES:
patent: 4851148 (1989-07-01), Yamasoe et al.
patent: 4857225 (1989-08-01), Terada et al.
patent: 5254156 (1993-10-01), Nakaso et al.
patent: 2002/0001887 (2002-01-01), Sung et al.
patent: 6-349791 (1994-12-01), None
patent: 11-243085 (1999-09-01), None
patent: 2000-82739 (2000-03-01), None
patent: 2000-277522 (2000-10-01), None
patent: 2001-247986 (2001-09-01), None
patent: 2001-308054 (2001-11-01), None
Hayamizu Naoya
Uematsu Ikuo
LandOfFree
Method of manufacturing electronic device does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of manufacturing electronic device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing electronic device will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3552178