Method of manufacturing electron-emitting device, electron sourc

Details Method of manufacturing electron-emitting device, electron sourc Method of manufacturing electron-emitting device, electron sourc

1994-12-19

1997-04-22

Powell, William

Etching a substrate: processes

Forming pattern using lift off technique

216100, 216101, B44C 122

Patent

active

056226349

ABSTRACT:
An electron-emitting device comprising a pair of device electrodes and an electroconductive film including an electron-emitting region is manufactured by a method comprising a process of forming an electroconductive film including steps of forming a pattern on a thin film containing a metal element on the basis of a difference of chemical state, and removing part of the thin film on the basis of the difference of chemical state.

REFERENCES:
patent: 4999083 (1991-03-01), Watanabe et al.
patent: 5066883 (1991-11-01), Yoshioka et al.
Patent Abstracts of Japan, vol. 014, No. 528 (1990), JP-A-02 223141.

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