Liquid crystal cells – elements and systems – Particular structure – Having significant detail of cell structure only
Reexamination Certificate
2005-05-24
2005-05-24
Ton, Toan (Department: 2871)
Liquid crystal cells, elements and systems
Particular structure
Having significant detail of cell structure only
C359S850000, C427S455000
Reexamination Certificate
active
06897921
ABSTRACT:
A reflecting member having roughness is formed on a surface above a substrate and transferred onto a film with an adhesive layer interposed therebetween. For example, a removable organic insulating layer having roughness on a surface thereof is formed above a glass substrate, and then a metal layer is formed on the rough surface of the organic insulating layer, thus forming a reflecting member. The reflecting member is then transferred onto the film with and adhesive layer interposed therebetween.
REFERENCES:
patent: 4519678 (1985-05-01), Komatsubara et al.
patent: 5317141 (1994-05-01), Thomas
patent: 5574292 (1996-11-01), Takahashi et al.
patent: 6127199 (2000-10-01), Inoue et al.
patent: 6130736 (2000-10-01), Sasaki et al.
patent: 6168851 (2001-01-01), Kubota
patent: 6233031 (2001-05-01), Ishitaka
patent: 6538711 (2003-03-01), Funahata et al.
patent: 4-267220 (1992-09-01), None
patent: 2000-171792 (2000-06-01), None
patent: 2000-193807 (2000-07-01), None
patent: 2000-258615 (2000-09-01), None
patent: 2000-267088 (2000-09-01), None
patent: 1998-071386 (1998-10-01), None
Furukawa Tadahiro
Murai Tatsuhiko
Okayasu Kimikazu
Sato Hisashi
Kyodo Printing Co., Ltd.
Lorusso, Loud & Kelly
Nguyen Hoan C.
Ton Toan
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