Method of manufacturing diffractive optical element

Details Method of manufacturing diffractive optical element Method of manufacturing diffractive optical element

2005-08-16

2005-08-16

Nguyen, Thong (Department: 2872)

Optical: systems and elements

Diffraction

From grating

C430S321000

Reexamination Certificate

active

06930834

ABSTRACT:
A method of manufacturing a diffractive optical element, including a process for forming a resist mask of blazed shape upon a substrate and for etching the substrate by use of the resist mask so that the blazed shape is transferred to the substrate. The method includes a process for forming, before the etching, an element being effective to prevent a taper shape, to be produced at an edge of the blazed shape of the resist mask, from being transformed to the substrate.

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Y. Suzuki et al., “Gas Plasma Etching of Chromium Films,” 21(9)Jap. J. Appl. Phys. 1328-1332 (1982).
F.H.M. Sanders et al., “Selective Isotropic Dry Etching of Si3N4Over SiO2,” 129(11)J. Electrochem. Soc. 2559-2561 (1982).

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