Method of manufacturing dielectric layer and method of...

Details Method of manufacturing dielectric layer and method of... Method of manufacturing dielectric layer and method of...

2004-11-29

2009-08-25

Talbot, Brian K (Department: 1792)

Coating processes

Electrical product produced

Piezoelectric properties

C427S379000, C427S384000, C029S025350

Reexamination Certificate

active

07579041

ABSTRACT:
A method of manufacturing a dielectric film includes a coating step of coating sol made of an organic metal compound and forming a dielectric precursor film, a drying step of drying the dielectric precursor film, a degreasing step of degreasing the dielectric precursor film, and a baking step of baking the dielectric precursor film to form a dielectric film. The drying step includes a first drying step of drying the dielectric precursor film by heating the dielectric precursor film to a temperature lower than a boiling point of a solvent which is a main solvent of the sol and then holding the dielectric precursor film at the temperature for a predetermined period of time, and a second drying step of drying the dielectric precursor film further by reheating the dielectric precursor film and then holding the dielectric precursor film at the temperature for a predetermined period of time.

REFERENCES:
patent: 5776788 (1998-07-01), Aoki et al.
patent: 5851841 (1998-12-01), Ushikubo et al.
patent: 6013970 (2000-01-01), Nishiwaki et al.
patent: 6103072 (2000-08-01), Nishiwaki et al.
patent: 6543107 (2003-04-01), Miyashita et al.
patent: 6767086 (2004-07-01), Murai
patent: 7291520 (2007-11-01), Murai
patent: 1 369 501 (2003-12-01), None
patent: 9-223830 (1997-08-01), None
patent: 2003-338607 (2003-11-01), None

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