Method of manufacturing dichroic filter array

Details Method of manufacturing dichroic filter array Method of manufacturing dichroic filter array

2006-05-10

2008-10-07

McPherson, John A. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Screen other than for cathode-ray tube

C430S323000, C430S324000, C216S024000

Reexamination Certificate

active

07432026

ABSTRACT:
A method of manufacturing a dichroic filter array is provided and comprises forming a first dichroic filter material layer on a substrate, and then forming a patterned photoresist layer on the first dichroic filter material layer. The exposed portion of the first dichroic filter material layer is removed so as to form a plurality of first dichroic filter units. A second dichroic filter material layer is formed on the substrate and the patterned photoresist layer. The patterned photoresist layer and the second dichroic filter material layer located on the patterned photoresist layer are removed, and the second dichroic filter material layer between the first dichroic filter units are transformed into a plurality of second dichroic filter units. By using etching process and the lift-off process to simultaneously remove redundant dichroic filter material and the photoreisit layer, the multi-chroic filter array device with a relatively small volume can be rapidly produced.

REFERENCES:
patent: 5711889 (1998-01-01), Buchsbaum
patent: 6342970 (2002-01-01), Sperger et al.
patent: 1685487 (2005-10-01), None
patent: 1-129203 (1989-05-01), None

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