Method of manufacturing devices having superlattice structures

Fishing – trapping – and vermin destroying

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148DIG46, 148DIG51, 148DIG84, 148DIG160, 357 16, 437 25, 437133, 437225, 437930, 437936, H01L 2120, H01L 21265

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049835408

ABSTRACT:
An ion beam (113) focused into a diameter of at most 0.1 .mu.m bombards substantially perpendicularly to the superlattice layers of a one-dimensional superlattice structure and is scanned rectilinearly in a direction of the superlattice layers so as to form at least two parallel grooves (108, 109, 110, 111) or at least two parallel impurity-implanted parts (2109) as potential barrier layers, whereby a device of two-dimensional superlattice structure can be manufactured. At least two parallel grooves (114, 115, 116, 117) or impurity-implanted parts are further formed orthogonally to the potential barrier layers of the two-dimensional superlattice structure, whereby a device of three-dimensional superlattice structure can be manufactured. In addition, deposition parts (2403, 2404, 2405) may well be provided by further depositing an insulator into the grooves (108, 109, 110, 111, 114, 115, 116, 117) which are formed by the scanning of the ion beam. Owing to these expedients, the portions of the two-dimensional and three-dimensional superlattice structures can be manufactured with ease and at high precision.

REFERENCES:
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Ishida et al., "Scan Speed . . . GaAs-AlGaAs Superlattices by Focused Si Ion Beam Implantation," Appl. Phys. Lett., vol. 51, No. 2, Jul. 13, 1987, pp. 109-111.
Miyauchi et al., "Application of Focused Ion Beam Technology . . . ", J. Vac. Sci. Technol. A, vol. 4, No. 3, May-Jun. 1986, pp. 933-938.
Patent Abstracts of Japan, vol. 11, No. 9 (P-534) (2456), Jan. 10, 1987.

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