Method of manufacturing combination type thin film magnetic head

Metal working – Method of mechanical manufacture – Electrical device making

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G11B 542

Patent

active

060762527

ABSTRACT:
A combination type thin film magnetic head including an inductive type writing thin film magnetic head and a magnetoresistive type reading thin film magnetic head successively stacked on a substrate is manufactured in the following manner. A metal or metal compound layer 14 serving as a mask for forming recessed portions 15 in a wafer surface is formed on the wafer surface, and at the same time electrode patterns P each including a plurality of electrode elements 31a-31f are formed from the same metal or metal compound material such that distances from a reference position of throat height zero to inner edges of respective electrode elements differ from each other. In the wafer surface, there are formed recessed portions 15 by the reactive ion etching while the metal or metal compound layer is used as a mask. After forming combination type thin film magnetic head units including inductive type thin film magnetic heads and magnetoresistive type thin film magnetic heads, the wager 11 is divided into bars B, in each of which the electrode patters P are formed at or near respective ends. A side surface 35 of the bar B is polished while conduction/cut-off condition of the electrode elements 31a-31f are monitored by a measuring circuit 36. The polishing is stopped when a predetermined electrode element 31c is opened. In this manner, the throat height and apex angle of the writing thin film magnetic head and the MR height of the reading thin film magnetic head can be formed accurately.

REFERENCES:
patent: 4689877 (1987-09-01), Church

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