Method of manufacturing ceramic filter

Details Method of manufacturing ceramic filter Method of manufacturing ceramic filter

2011-04-12

2011-04-12

Kornakov, Michael (Department: 1712)

Coating processes

Restoring or repairing

C427S235000, C427S238000, C427S294000, C427S532000, C427S541000, C095S043000, C095S045000, C210S348000, C210S490000, C210S496000, C210S497010, C210S500230

Reexamination Certificate

active

07923060

ABSTRACT:
There is disclosed a method of manufacturing a thin and uniform ceramic filter formed with less membrane formation times and having less defects. A ceramic sol whose average pore diameter after the sol itself has been formed into a membrane is larger than that of a ceramic separation membrane and is 10 nm or less is brought into contact with the surface of a ceramic separation membrane having an average pore diameter of 0.5 to 10 nm, and the ceramic separation membrane having the ceramic sol is dried and then fired to repair a defect portion of the ceramic separation membrane.

REFERENCES:
patent: 4711719 (1987-12-01), Leenaars et al.
patent: 4737323 (1988-04-01), Martin et al.
patent: 5672388 (1997-09-01), McHenry et al.
patent: 5762841 (1998-06-01), Shimai et al.
patent: 5770275 (1998-06-01), Raman et al.
patent: 5772735 (1998-06-01), Sehgal et al.
patent: 6383563 (2002-05-01), Bratton et al.
patent: 2008/0096751 (2008-04-01), Isomura et al.
patent: 0 401 928 (1990-12-01), None
patent: 03-267129 (1991-11-01), None
patent: 2006297179 (2006-11-01), None
Tsuru et al., “Silica-zirconia membranes for nanofiltration,” Journal of Membrane Science 149 (1998) p. 127-135.

Affiliated with

Also associated with

Rating

Method of manufacturing ceramic filter does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing ceramic filter, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing ceramic filter will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2733404