Method of manufacturing ceramic film, method of...

Semiconductor device manufacturing: process – Having magnetic or ferroelectric component

Reexamination Certificate

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C117S006000, C117S007000, C257SE21002

Reexamination Certificate

active

10722422

ABSTRACT:
A lower electrode is formed over a substrate, and a raw material including a complex oxide is heated in an atmosphere pressurized to two atmospheres or more and containing oxygen at a volume ratio of 10% or less at a temperature raising rate of 100° C./min or less, thereby forming a lower alloy film of a compound of a first metal which makes up the complex oxide, and a second metal, which makes up the lower electrode, over the lower electrode. A ceramic film in which the raw material is crystallized is formed over the lower alloy film, and an upper electrode is formed over the ceramic film.

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