Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1977-09-27
1979-04-03
Meros, Edward J.
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
106 65, 106 734, 264 65, C01B 2100, C01B 3326
Patent
active
041477596
ABSTRACT:
Method of manufacturing silicon nitrides with a general formula of Si.sub.6-z Al.sub.z O.sub.z N.sub.8-z, in which z is a number less than or equal to 2.8. Silicon nitride is made to react at a temperature higher than 1600.degree. C. and in the finely divided state on aluminium oxynitride, and in the presence of an agent which generates gaseous silicon monoxide. Application to the manufacture of hard materials of high resistance to oxidation and to creep at high temperature.
REFERENCES:
patent: 3903230 (1975-09-01), Kamigaito et al.
patent: 3991148 (1976-11-01), Lumby et al.
Oyama, Japan J. Appl. Phys. 11 (1972) pp. 760-761.
Jack et al "Nature Physical Science" vol. 238, Jul. 10, 1972, pp. 28-29.
Ceraver
Meros Edward J.
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