Method of manufacturing array substrate of horizontal...

Details Method of manufacturing array substrate of horizontal... Method of manufacturing array substrate of horizontal...

2011-03-15

2011-03-15

Blum, David S (Department: 2813)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C349S038000, C257SE21158, C257SE21535

Reexamination Certificate

active

07906356

ABSTRACT:
A method of manufacturing an array substrate of horizontal electric field type transreflective LCD is provided in the invention. An array substrate of liquid crystal display is obtained by using one full tone mask and two dual tone masks according to the method. Specifically, the gate line, the gate electrode and the display region are formed by using a full tone mask, the thin film transistor, the transmissive region and the reflective region on the electrode are formed by using a first dual tone mask, and the via hole and the electrode with slits are formed by using a second dual tone mask.

REFERENCES:
patent: 7656500 (2010-02-01), Ahn
patent: 7688414 (2010-03-01), Oh et al.
patent: 1020070080476 (2007-08-01), None
patent: 1020070114472 (2007-12-01), None

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