Fishing – trapping – and vermin destroying
Patent
1994-09-01
1996-12-31
Wilczewski, Mary
Fishing, trapping, and vermin destroying
H01L 21302, H01L 21463
Patent
active
055894216
ABSTRACT:
A chemical vapor deposition apparatus comprises a reaction chamber for annealing a silicon wafer, a transportation mechanism for transporting the silicon wafer to the reaction chamber, a detecting device for detecting temperature of the reaction chamber, and an operation control device for receiving signals corresponding to the temperature of the reaction chamber, and supplying to the transportation mechanism, other signals for preventing the silicon wafer from being transported when the temperature is 100.degree. C. or more.
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Baba Yoshiro
Koyama Mitsutoshi
Miyashita Naoto
Nunotani Shinji
Takahashi Koichi
Dutton Brian K.
Kabushiki Kaisha Toshiba
Wilczewski Mary
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