Superconductor technology: apparatus – material – process – High temperature devices – systems – apparatus – com- ponents,... – Superconductor next to layer containing nonsuperconducting...
Patent
1994-12-01
1995-11-21
Kunemund, Robert
Superconductor technology: apparatus, material, process
High temperature devices, systems, apparatus, com- ponents,...
Superconductor next to layer containing nonsuperconducting...
505473, 505474, 505475, 505729, 505730, 117 84, C30B 2516
Patent
active
054688060
ABSTRACT:
Disclosed is a method of manufacturing a thin film of an oxide superconductor represented by formula Sr.sub.1-x Nd.sub.x CuO.sub.2 on a substrate. The oxide superconductor has a tetragonal crystal structure, the lattice constant in a-axis falling within a range of between 0.385 nm and 0.410 nm, and the lattice constant in c-axis being an integer number of times as much as a level falling within a range of between 0.310 nm and 0.350 nm. The method includes the steps of forming by epitaxial growth a film of a crystal having lattice constants close to those of the crystal of said oxide superconductor on a substrate, and forming a thin film of the oxide superconductor of a tetragonal crystal structure represented by general formula (I) by a thin film-forming technique.
REFERENCES:
Sugii et al., "Superconducting Thin Films of Infinite-Layer Sr.sub.1-x Nd.sub.x CuO.sub.y Synthesized by Pulsed-Laser Deposition,"Jpn. J. Appl. Phys. vol. 31 (1992) Aug. 1, 1992 pp. L1024-L1026.
Niu et al. "Growth of the Infinite Layer Phase of Sr.sub.1-x Nd.sub.x CuO.sub.2 by Laser Ablation", Applied Physics Letters 61(14) Oct. 1992 pp. 1712-1714.
Myoren, H. et al., "Crystalline Qualities and Critical Current Densities of As-Grown Ba.sub.2 YCu.sub.3 O.sub.x Thin Film on Silicon with Buffer Layers", Japn. J. Appl. Phys. vol. 29, No. 6, Jun. 1990, pp. L955-L957 (Exhibit 3).
Robert J. Cava, Parent Structure Superconducts, Nature, vol. 351, pp. 518-519 (1991).
Nobuyuki Sugii et al., Growth of Sr.sub.1-x Nd.sub.x CuO.sub.y Thin Films by RF-Magnetron Sputtering and Their Crystallographic Properties, Physica C, vol. 196, pp. 129-134 (1992).
H. Adachi et al., Superconducting (Sr, Nd)CuO.sub.y Thin Films with Infinite-Layer Structure, Physica C, vol. 196, pp. 14-16 (1992).
M. Ichikawa et al., Preparation of Infinite-Layer Stractural [sic] (Sr,Nd)CuO.sub.y Thin Films, IEEE Transactions on Applied Superconductivity, vol. 3, pp. 1571-1574 (1993).
M. G. Smith et al., Electron-Doped Superconductivity at 40K in the Infinite-Layer Compound Sr.sub.1-y Nd.sub.y CuO.sub.2, Nature, vol. 351, pp. 549-551 1991.
Ichikawa Michiharu
Kubo Koichi
Sugii Nobuyuki
Yamamoto Kiyoshi
Yamauchi Hisao
Central Research Institute of Electric Power Industry
Hitachi , Ltd.
International Superconductivity Technology Center
Kabushiki Kaisha Toshiba
Kunemund Robert
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