Method of manufacturing an optical waveguide by switching a d.c.

Optical waveguides – Planar optical waveguide – Thin film optical waveguide

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G02B 610

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050527690

ABSTRACT:
In a method of manufacturing an optical waveguide which comprises a substrate having a first refractive index and a light-transmitting passage which is buried into the substrate and which is formed by an ionizable substance having a second refractive index greater than the first refractive index, the ionizable substance is diffused into the substrate from an overlying layer through a diffusion-suppressing layer by impressing a positive polarity of a d.c. voltage and forms a diffused region. Thereafter, the ionizable substance is partially released from the diffused region towards the overlying layer by impressing a negative polarity of the d.c. voltage. A configuration of the diffused region is thus controlled during impression of the negative polarity of the d.c. voltage and formed into the light-transmitting passage.

REFERENCES:
patent: 4691983 (1987-09-01), Kobayashi et al.
patent: 4932743 (1990-06-01), Isobe et al.

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