Metal working – Method of mechanical manufacture – Electrical device making
Reexamination Certificate
2008-07-29
2008-07-29
Tugbang, A. Dexter (Department: 3729)
Metal working
Method of mechanical manufacture
Electrical device making
C438S653000, C438S674000, C438S675000
Reexamination Certificate
active
10268648
ABSTRACT:
A method for manufacturing an inductance in a monolithic circuit including a substrate of planar upper surface, including the steps of forming in the substrate a cavity substantially following the contour of the inductance to be formed, the cross-section of the cavity being deep with respect to its width; and filling the cavity with a conductive material.
REFERENCES:
patent: 3415679 (1968-12-01), Chuss
patent: 5363080 (1994-11-01), Breen
patent: 5398400 (1995-03-01), Breen
patent: 5545916 (1996-08-01), Koullias
patent: 6211073 (2001-04-01), Ahn et al.
patent: 6417755 (2002-07-01), Liu et al.
patent: 6531945 (2003-03-01), Ahn et al.
patent: 2001/0017395 (2001-08-01), Takamura
patent: 0 932 204 (1999-07-01), None
patent: 1 054 417 (2000-11-01), None
patent: 10-154797 (1998-06-01), None
Angelescu et al., “Electrical Characterization of Porous Silicon”, CAS'95 Proceedings, 1995 International Semiconductor Conference, pp. 335-338, Oct. 1995.
Nam et al., “High-Performance Planar Inductor on Thick Oxidized Porous Silicon (OPS) Substrate”, IEEE Microwave and Guided Wave Letters, vol. 7, No. 8, pp. 236-238, Aug. 1997.
Hayashi et al., “Multilayer Thin-Film Type of Magnetic Induction Device and Manufacturing Method Thereor”, English Translation of Japanese Patent Application 10-303037.
French Search Report from French Patent Application No. 01/13055, filed Oct. 10, 2001.
Patent Abstracts of Japan, vol. 1999, No. 02, Feb. 26, 1999 & JP 10 303037 A (Fuji Electric Co. Ltd.) Nov. 13, 1998.
“Method For Inductive Coil Fabrication” Research Disclosure, Kenneth Mason Publications, Hampshire, GB, No. 440, Dec. 2000, p. 2226.
Auriel Gérard
Gardes Pascal
Morris James H.
STMicroelectronics S.A.
Tugbang A. Dexter
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