Method of manufacturing an image sensor having microlenses...

Details Method of manufacturing an image sensor having microlenses... Method of manufacturing an image sensor having microlenses...

2006-12-15

2009-02-17

Coleman, W. David (Department: 2823)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

C438S070000, C257SE31128

Reexamination Certificate

active

07491571

ABSTRACT:
A method for manufacturing an image sensor is provided. The method includes: forming a plurality of photodiodes on a semiconductor substrate; forming an interlayer dielectric on the semiconductor substrate; forming a color filter layer on the interlayer dielectric; forming a planarization layer on the color filter layer; and forming microlenses on the planarization layer under high temperature and pressure.

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