Method of manufacturing an image sensor

Details Method of manufacturing an image sensor Method of manufacturing an image sensor

1991-10-11

1993-05-25

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437101, 437196, 156653, H01L 3120

Patent

active

052139840

ABSTRACT:
A metal film and a doped a-Si film are deposited on a glass substrate, and successively etched by photolithography using the same resist pattern, to form a metal electrode and doped a-Si layers. The doped a-Si layers thus formed are then re-etched to remove portions protruding from the metal electrode. Then, a non-doped a-Si layer and a transparent electrode are successively formed on the doped a-Si layer. A protection film may additionally be deposited on the glass substrate before the deposition of the metal film.

REFERENCES:
patent: 4997773 (1991-03-01), Nobue et al.
patent: 5075237 (1991-12-01), Wu
patent: 5075244 (1991-12-01), Sakai et al.

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