Method of manufacturing an electronic device and a...

Details Method of manufacturing an electronic device and a... Method of manufacturing an electronic device and a...

2005-05-17

2005-05-17

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

C430S311000

Reexamination Certificate

active

06893785

ABSTRACT:
A method of manufacturing an electronic device, such as a high-speed semiconductor integrated circuit device, provides improved dimensional accuracy in transferring fine patterns. Photolithography for gate patterns and wiring patterns is carried out by exposing a halftone phase-shift mask having shade areas made of resist with an oblique illumination system, and photolithography for contact hole patterns is carried out by using a photomask having a metal shade film with metal alignment wafer marks.

REFERENCES:
patent: 5-181257 (1993-07-01), None
patent: 5-289307 (1993-11-01), None
patent: 9-211837 (1997-08-01), None

Affiliated with

Also associated with

Rating

Method of manufacturing an electronic device and a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing an electronic device and a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing an electronic device and a... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3440074