Method of manufacturing an electron-sensitive resin, and an appl

Details Method of manufacturing an electron-sensitive resin, and an appl Method of manufacturing an electron-sensitive resin, and an appl

1976-03-09

1978-01-17

Marquis, Melvyn I.

Chemistry of carbon compounds

Miscellaneous organic carbon compounds

C-metal

260 465G, G02B 514

Patent

active

040689190

ABSTRACT:
A method of manufacturing an electron-sensitive resin capable of constituting the material of an optical waveguide having a width of the order of 1 micron and transmission loss lower than 2 db/cm, is provided. The method comprises, carried out under conditions of extremely high purity, the hydrolysis of trichlorosilane, to give phenylsilanetriol, the preparation of a benzenic collodion of this product and then the polymerization in the hot state of a phenylsilanetriol solution, and the conversion of the resultant polymer into the polyphenylsiloxanol which is fractionated by successive extremely fine filtering operations carried out upon a solution of this product, into batches having different degrees of polymerization, each of them fitting a typical optical waveguide.

REFERENCES:
patent: 3017385 (1962-01-01), Sprung et al.
patent: 3767445 (1973-10-01), Chandross et al.
patent: 3822928 (1974-07-01), Smolinsky et al.

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