Method of manufacturing an aperture pattern printing plate

Details Method of manufacturing an aperture pattern printing plate Method of manufacturing an aperture pattern printing plate

1990-03-01

1992-07-07

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 23, 430292, 430302, 430325, 430327, 355 87, 355 91, 313402, 313403, G03F 900

Patent

active

051282240

ABSTRACT:
A method of manufacturing an aperture pattern printing plate in a limited number of steps using only one original printing plate. The method produces transparent portions on a portion of the printing plate corresponding to a non-effective area of a shadow mask, and opaque portions on a portion of the printing plate corresponding to an effective area of a shadow mask. The method has the steps of bringing a transparent plate having an unexposed transparent photosensitive layer formed on at least one of its principal surfaces into contact with an original plate having opaque areas corresponding to apertures in a to be constructed shadow mask. A first exposure is performed on the photosensitive layer through the original plate. The photosensitive layer is then developed to render exposed portions of the photosensitive layer opaque. These opaque portions are then etched away. A portion of the photosensitive layer corresponding to the non-effective area of a shadow mask is then covered to prevent exposure. A second exposure of the photosensitive layer is then performed; thereby achieving exposure of only the portion of the photosensitive layer corresponding to an effective area of a shadow mask. The photosensitive layer is then developed to render the exposed portions of the photosensitive layer opaque. By etching away the opaque portions produced after development of the first exposure, air passages are produced on the whole surface of the transparent plate.

REFERENCES:
patent: 3615468 (1971-10-01), Tiala
patent: 3751250 (1973-07-01), Moscony et al.
patent: 4020493 (1977-04-01), Palac et al.
patent: 4115118 (1978-09-01), Kubotera et al.
patent: 4309495 (1982-01-01), Ernsberger
patent: 4311773 (1982-01-01), Kaneko et al.
patent: 4588676 (1986-05-01), Moscony et al.
patent: 4656107 (1987-04-01), Moscony et al.
patent: 4664996 (1987-05-01), Moscony et al.
patent: 4669871 (1987-06-01), Wetzel et al.
patent: 4891296 (1990-01-01), Tsurukiri et al.
W. S. DeForest, "Photoresist Materials and Processes", McGraw-Hill Inc., 1975, Chapter 1, pp. 1-4.

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