Method of manufacturing an analytical sample and method of...

Chemistry: analytical and immunological testing – Nuclear magnetic resonance – electron spin resonance or other...

Reexamination Certificate

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C528S015000, C528S030000, C528S031000, C528S032000, C528S033000, C528S034000, C528S036000, C528S042000, C526S279000, C556S413000, C556S450000, C556S457000, C556S458000, C556S459000

Reexamination Certificate

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07846741

ABSTRACT:
A method of manufacturing an analytical sample by a secondary ion mass spectrometry method is provided, which comprises a step of forming a separation layer over a substrate, a step of forming one of a thin film and a thin-film stack body to be analyzed over the separation layer, a step of forming an opening portion in one of the thin film and the thin-film stack body, a step of attaching a supporting body to one of a surface of the thin film and a surface of a top layer of the thin-film stack body, and a step of separating one of the thin film and the thin-film stack body from the substrate.

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patent: 2000-105180 (2000-04-01), None
patent: 2000-121520 (2000-04-01), None
patent: WO 2006/123825 (2006-11-01), None
Yeo et al., SIMS backside depth profiling of ultrashallow implants using silicon-on-insulator substrates, 2002, Surface and Interface Analysis, vol. 33, pp. 373-375.

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