Method of manufacturing amorphous silicon electrophotographic ph

Details Method of manufacturing amorphous silicon electrophotographic ph Method of manufacturing amorphous silicon electrophotographic ph

1996-03-13

1998-06-16

Goodrow, John

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430128, G03G 5082

Patent

active

057668116

ABSTRACT:
A method for stably manufacturing, with improved reproducibility, a good amorphous silicon electrophotographic photosensitive member improved in potential characteristics such as chargeability and photo-response as well as in the effect of reducing photo-memory and defects which cause spot image defects. A film is formed by plasma CVD on a base of the photosensitive member by using electromagnetic waves having a frequency of 13.56 MHz or higher as power for forming plasma under conditions that the spatial potential of plasma generated by the electromagnetic waves with respect to a base of the photosensitive member is not higher than 120 V and the current density of ions incident upon the base is not lower than 0.4 mA/cm.sup.2.

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"Glow Discharge Processs" by Brian Chapman, pp. 168-169, John Wiley & Sons.

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