Method of manufacturing a trench isolation structure for a...

Semiconductor device manufacturing: process – Forming bipolar transistor by formation or alteration of... – Including isolation structure

Reexamination Certificate

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C438S354000, C438S355000, C438S359000, C438S404000, C438S405000, C438S424000, C438S425000, C438S426000, C438S427000, C438S428000, C438S437000, C438S444000, C438S445000, C438S448000, C438S452000

Reexamination Certificate

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06943088

ABSTRACT:
In a trench isolation structure of a semiconductor device, oxide liners are formed within the trenches, wherein a non-oxidizable mask is employed during various oxidation steps, thereby creating different types of liner oxides and thus different types of corner rounding and thus mechanical stress. Therefore, for a specified type of circuit elements, the characteristics of the corresponding isolation trenches may be tailored to achieve an optimum device performance.

REFERENCES:
patent: 4671970 (1987-06-01), Keiser et al.
patent: 5581110 (1996-12-01), Razouk et al.
patent: 6057241 (2000-05-01), Matsuda et al.
patent: 6087243 (2000-07-01), Wang
patent: 6136664 (2000-10-01), Economikos et al.
patent: 6228746 (2001-05-01), Ibok
patent: 6251734 (2001-06-01), Grivna et al.
patent: 6518146 (2003-02-01), Singh et al.
patent: 6733955 (2004-05-01), Geiger et al.
patent: 2002/0020887 (2002-02-01), Lee et al.
patent: 2002/0070430 (2002-06-01), Oh et al.
patent: 2002/0086495 (2002-07-01), Yoo et al.

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