Metal working – Method of mechanical manufacture – Electrical device making
Patent
1987-01-08
1988-12-20
Echols, P. W.
Metal working
Method of mechanical manufacture
Electrical device making
156643, 156646, 156652, 156656, 1566591, 156667, G11B 5127
Patent
active
047917199
ABSTRACT:
A first magnetic layer is formed upon a non-magnetic substrate, a gap layer is formed upon the first magnetic layer, a conductor coil covered with an insulation layer is formed upon the gap layer, a second magnetic layer is formed upon the gap layer and the insulation layer, a magnetic gap being formed between the first and second magnetic layers at a front portion facing a recording medium, and the second magnetic layer being connected to the first magnetic layer at a back portion. After forming a mask made of metal oxide upon the second magnetic layer, the second magnetic layer, the gap layer, and the first magnetic layer are formed into a predetermined shape respectively at the tip portion by dry etching. Thus, a high performance thin-film magnetic head having the same widths for the first and second magnetic layers is obtained.
REFERENCES:
patent: 4317149 (1982-02-01), Elser et al.
patent: 4390394 (1983-06-01), Mathuni et al.
patent: 4422117 (1983-12-01), Nomura et al.
patent: 4436593 (1984-03-01), Osborne et al.
patent: 4592801 (1986-06-01), Hara et al.
Hara Shin-ichi
Kobayashi Tetsuo
Narishige Shinji
Tsukada Yukihisa
Echols P. W.
Hitachi , Ltd.
LandOfFree
Method of manufacturing a thin-film magnetic head does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of manufacturing a thin-film magnetic head, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing a thin-film magnetic head will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1902959