Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Patent
1998-10-15
2000-03-28
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
427130, 427131, 427132, 427258, 427264, 427270, 427271, 4273722, 427402, 427599, 437225, 437226, H01F 100
Patent
active
060428996
ABSTRACT:
In a method of manufacturing a thin-film magnetic device having a magnetic film provided with uniaxial magnetic anisotropy, the magnetic film, which is formed on a Si wafer, is patterned, before it is heat-treated in a magnetic field, in such a manner that the length of the magnetic film in a direction parallel to that of the magnetic field is greater than the length of the magnetic film in a direction perpendicular thereto. The magnetic film is divided into band-like magnetic films, and the band-like magnetic films are heat-treated in the magnetic field and each provided with uniaxial magnetic anisotropy. The band-like magnetic films are patterned and each divided again into magnetic films of a chip size. Thus, a crack or a blister can be prevented from occurring on the magnetic film, and the magnetic characteristics of the magnetic film can be prevented from deteriorating.
Kabushiki Kaisha Toshiba
Pianalto Bernard
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