Method of manufacturing a surface-emitting laser

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Mesa formation

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438 43, H01L 2100

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active

058540881

ABSTRACT:
In a method of fabricating a surface-emitting laser, to assure good electrical confinement and good flatness of the mirrors defining the resonant cavity of the laser an electrical confinement layer is formed by carrying out the following steps:

REFERENCES:
patent: 5343487 (1994-08-01), Scott et al.
patent: 5416044 (1995-05-01), Chino et al.
P.D. Floyd et al, "Comparison of opticallosses in dielectric apertured vertical cavity lasers", IEEE Photonics Technology Letters, vol. 8, No. 5, May 1996, New York, US pp. 5990-592.
G. S. Li et al, "Polarisation & Modal Behaviour of Low Threshold Oxide and Airgap Confined Airgap Confined Vertical Cavity Lasers", Electronics Letters, vol. 31, No. 23, 9 Nov. 1995, pp. 2014/2015.
J. W. Scott et al, "High Efficiency Submilliamp Vertical Cavity Lasers with Intracavity Contacts", IEEE Photonics Technology Letters, vol. 6, No. 6, 1 Jun. 1994, pp. 678-600.
G. M. Yang et al, "Influence of Mirror Reflectivity on Laser Peformance of Very-Low-Threshold Vertical Cavity Surface-Emitting Lasers", IEEE Photonics Technology Letters, vol. 7, No. 11, 1 Nov. 1995, pp. 1228-1230.
G. M. Yang et al, "Ultralow Threshold Current Vertical-Cavity Surface-Emitting Lasers Obtained with Selective Oxidation", Electronics Letters, vol. 31, No. 11, 25 May 1995, pp. 886-888.
Patent Abstracts of Japan, vol. 95, No. 003 corresponding to JP 07 058408 A (Furukawa Electric Co., Ltd: The) 3 Mar. 1995.

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