Method of manufacturing a surface acoustic wave device

Metal working – Method of mechanical manufacture – Electrical device making

Reexamination Certificate

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C029S592100, C029S609100, C181S171000, C181S172000, C204S192150, C381S173000, C381S174000, C381S175000, C367S140000, C367S141000, C367S170000, C367S171000, C367S181000

Reexamination Certificate

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06928720

ABSTRACT:
A surface acoustic wave device includes a piezoelectric substrate and at least one interdigital electrode disposed on the piezoelectric substrate. The interdigital electrode is made of α-tantalum.

REFERENCES:
patent: 4340834 (1982-07-01), Sato
patent: 5221449 (1993-06-01), Colgan
patent: 5281485 (1994-01-01), Colgan et al.
patent: 5847486 (1998-12-01), Kadota et al.
patent: 5850167 (1998-12-01), Abe
patent: 6088462 (2000-07-01), Fujimoto et al.
patent: 6144057 (2000-11-01), Yamazaki
patent: 6154105 (2000-11-01), Fujimoto et al.
patent: 6191031 (2001-02-01), Taguchi et al.
patent: 61-45892 (1986-10-01), None
patent: 63-185052 (1988-07-01), None
patent: 02251823 (1990-10-01), None
patent: 04186815 (1992-07-01), None
patent: 8-019516 (1996-02-01), None
patent: 10-247835 (1998-09-01), None
“Control of second order temperature coefficient of SAW propagating in two thin film layers”; Nakagawa, Y.; Ultrasonics Symposium, 1983. Proceedings., IEEE 1993, Oct. 31-Nov. 3, 1993 pp.: 287-290.

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