Metal working – Method of mechanical manufacture – Electrical device making
Reexamination Certificate
2007-01-09
2007-01-09
Kim, Paul D. (Department: 3729)
Metal working
Method of mechanical manufacture
Electrical device making
C029S603070, C029S603130, C029S603140, C029S603150, C029S603180, C216S062000, C216S065000, C216S066000, C257S344000, C360S324100, C360S324110, C360S324120, C360S324200, C427S127000, C427S128000, C438S301000, C438S706000
Reexamination Certificate
active
10778079
ABSTRACT:
Multiple thin films of spin-valve GMR sensor are formed in a trapezoidal cross-sectional shape by laminating an antiferromagnetic layer, a pinned magnetic layer, a nonmagnetic conductive layer, a free magnetic layer and a nonmagnetic protective layer on a lower insulated gap layer. The amount of etching of the lower insulated gap layer produced in the process of patterning the spin-valve giant magnetoresistive layers into the multiple thin films of spin-valve GMR sensor is 10 nm or less. Further, the angle θ which the tangent line of each side face of the multiple thin films to the middle line of the free magnetic layer in its thickness direction forms with respect to the middle line of the free magnetic layer becomes 45 degrees or more. This structure makes it possible to provide such a spin-valve giant magnetoresistive head that it meets the requirements for securing constant breakdown voltage and preventing instability of MR output voltage waveform.
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“Performance of yoke type GMR heads”; Folkerts, W.; Kools, J.C.S.; de Nooijer, M.C.; Ruigrok, J.J.M.; Postma, L.; Lenssen, K.M.H.; Somers, G.H.J.; Coehoorn, R.; Magnetics, IEEE Transactions; Nov. 1995; pp. 2591-2596.
Arasawa Masatoshi
Kagawa Masayasu
Kojima Shuichi
Morijiri Makoto
Nishioka Koichi
Antonelli, Terry Stout and Kraus, LLP.
Hitachi Global Storage Technologies Japan Ltd.
Kim Paul D.
LandOfFree
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