Fishing – trapping – and vermin destroying
Patent
1989-08-29
1990-04-10
Chaudhuri, Olik
Fishing, trapping, and vermin destroying
437228, 437229, 156643, 156646, H01L 2182
Patent
active
049160877
ABSTRACT:
A method of manufacturing a semiconductor device includes the steps of (a) depositing a first insulating film by an isotropic deposition method over the entire surface of a semiconductor substrate which is provided with a narrow trench having an opening width in submicrons and a broad trench having an opening width larger than 1 .mu.m so that the narrow and broad trenches are substantially filled with the first insulating film; (b) removing the first insulating film by an isotropic dry etching method; (c) depositing a second insulating film over the entire surface of the semiconductor substrate by an isotropic deposition method so that the narrow and broad trenches are substantially filled with the second insulating film; (d) forming a first resist layer on the broad trench filled with the second insulating film; (e) forming a second resist layer over the entire surface of the second insulating film and the first resist layer thereon; and (f) removing the first and second resist layers and the second insulating film by an anisotropic dry etching method until the surface of the semiconductor substrate is flattened.
REFERENCES:
patent: 4570325 (1986-02-01), Higuchi
Kawai Masato
Onishi Shigeo
Tateoka Hidehisa
Chaudhuri Olik
Sharp Kabushiki Kaisha
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