Method of manufacturing a semiconductor device and products...

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation

Reexamination Certificate

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C438S092000, C438S093000, C438S094000, C438S167000, C438S172000, C438S181000, C438S186000, C438S188000, C438S191000, C438S235000, C257SE21066, C257SE21403

Reexamination Certificate

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07605017

ABSTRACT:
Methods of manufacturing a semiconductor device and resulting products. The semiconductor device includes a semiconductor substrate, a hetero semiconductor region hetero-adjoined with the semiconductor substrate, a gate insulation layer contacting the semiconductor substrate and a heterojunction of the hetero semiconductor region, a gate electrode formed on the gate insulation layer, an electric field alleviation region spaced apart from a heterojunction driving end of the heterojunction that contacts the gate insulation layer by a predetermined distance and contacting the semiconductor substrate and the gate insulation layer, a source electrode contacting the hetero semiconductor region and a drain electrode contacting the semiconductor substrate. A mask layer is formed on the hetero semiconductor region, and the electric field alleviation region and the heterojunction driving end are formed by using at least a portion of the first mask layer.

REFERENCES:
patent: 7282739 (2007-10-01), Kaneko
patent: 2004/0217358 (2004-11-01), Kaneko
patent: 2006/0060917 (2006-03-01), Hayashi et al.
patent: 2006/0223274 (2006-10-01), Shimoida et al.
patent: 2007/0221955 (2007-09-01), Shimoida et al.
patent: 2007/0252168 (2007-11-01), Shimoida et al.
patent: 2007/0262324 (2007-11-01), Kaneko
patent: 1 519 419 (2005-03-01), None
patent: 1 641 030 (2006-03-01), None
patent: 2003-318398 (2003-07-01), None

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