Method of manufacturing a reflector

Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate

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427162, 427264, 427270, 427272, 427282, 4273831, 4273855, 427404, 4274071, 427595, B05D 300

Patent

active

057925208

ABSTRACT:
A copper film layer and a resin film are sequentially layered on a skin material, the resin film is irradiated with a laser beam so as to be removed, a mask is formed on the copper film layer by use of the residual of the resin film, thereafter, an etching process is provided thereto, so that a copper film layer pattern is formed on the reflective surface of the skin material.

REFERENCES:
patent: 4835087 (1989-05-01), Bielli et al.
patent: 4860023 (1989-08-01), Halm
patent: 5364493 (1994-11-01), Hunter, Jr. et al.

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