Method of manufacturing a reflection type mask blank and...

Details Method of manufacturing a reflection type mask blank and... Method of manufacturing a reflection type mask blank and...

2006-06-06

2006-06-06

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07056627

ABSTRACT:
A method of manufacturing a reflection type mask blank by forming a multilayer reflection film reflecting exposure light on a substrate and forming an absorber layer absorbing the exposure light on the multilayer reflection film includes a step of forming, between the substrate and the multilayer reflection film, a stress correction film opposite in direction to film stress of the multilayer reflection film and smaller in absolute value than the film stress of the multilayer reflection film, a step of heat-treating the stress correction film, and a step of heat-treating the multilayer reflection film.

REFERENCES:
patent: 6309705 (2001-10-01), Montcalm et al.
patent: 6352803 (2002-03-01), Tong et al.
patent: 6696205 (2004-02-01), Brooks et al.
patent: 8-213303 (1996-08-01), None
patent: 2002-15981 (2002-01-01), None

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