Method of manufacturing a phase shift mask comprising two phase

Details Method of manufacturing a phase shift mask comprising two phase Method of manufacturing a phase shift mask comprising two phase

1992-05-07

1994-04-05

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, 430324, G03F 900

Patent

active

053003772

ABSTRACT:
In order to manufacture a phase shift mask for hyperfine patterning, a sidewall phase shift mask is formed on both sides of each phase shift film in a spatial frequency modulation type phase shift mask. Accordingly, the light intensity occurring from the end part of the phase shift film, as the forming factor of the bridge pattern film, is reduced by the sidewall phase shift film.

REFERENCES:
patent: 5045417 (1991-09-01), Okamoto
patent: 5079113 (1992-01-01), Ohta et al.

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