Method of manufacturing a pattern of conductive material

Coating processes – Electrical product produced – Condenser or capacitor

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427 85, 427 96, 156628, 156657, H01L 2102, H01L 2128

Patent

active

045900930

ABSTRACT:
A method of providing narrow conductor tracks of metal silicide is provided. According to this technique, a pattern of polycrystalline silicon covered by a protective layer is converted along the edges into the silicide by covering the device with a metal. The edges are then silicidized laterally over a distance of 20 to 500 nm. The remaining silicon is selectively removed, and the tracks obtained can serve as conductor masks, such as, for example, a plate of a capacitor.

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