Method of manufacturing a mask for the production of patterns in

Details Method of manufacturing a mask for the production of patterns in Method of manufacturing a mask for the production of patterns in

1984-10-26

1986-08-19

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192C, 430 5, 378 35, 156645, C23C 1500

Patent

active

046068031

ABSTRACT:
A method of manufacturing a mask for producing patterns in lacquer layers by means of X-ray lithography comprising a diaphragm which is very transparent to the X-ray radiation, is stretched on a frame in a self-supporting manner and which is applied as a thin layer to a substrate in a manner such that it is subjected to tensile stress, while the substrate is then removed as far as a part constituting a frame for the then self-supporting diaphragm.

REFERENCES:
patent: 4198263 (1980-04-01), Matsuda
patent: 4384919 (1983-05-01), Casey

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